Hiromasa Mochiki

Title: Hiromasa Mochiki: Innovator in Etching Processing Technology

Introduction

Hiromasa Mochiki is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of etching processing technology, holding a total of 10 patents. His innovative methods have advanced the capabilities of substrate processing apparatuses.

Latest Patents

One of Hiromasa Mochiki's latest patents is an etching processing method designed for etching a substrate that is formed with a target film and a mask film. This method is executed in a substrate processing apparatus that includes a first and a second power supply, which provide higher and lower high-frequency power to a processing space and a mounting table. Additionally, a DC power supply is utilized to supply DC power to an electrode. The method consists of a modification step that alters the shape of a pattern on the mask film, followed by an etching step that etches the target film using the mask film. During the modification step, the mask film is etched by plasma. In the etching step, DC power is applied to the electrode while the lower high-frequency power is applied to the mounting table in a pulsed waveform, alternating between higher and lower power levels.

Career Highlights

Hiromasa Mochiki has worked with notable companies in the technology sector, including Tokyo Electron Limited and IBM. His experience in these organizations has contributed to his expertise in etching processing methods and substrate technology.

Collaborations

Some of his coworkers include Shin Okamoto and Fumio Yamazaki, who have collaborated with him on various projects throughout his career.

Conclusion

Hiromasa Mochiki's innovative work in etching processing technology has made a significant impact in the field. His patents and career achievements reflect his dedication to advancing substrate processing methods.