Hiroki Yonemitsu

Title: Hiroki Yonemitsu: Innovator in Polymer Material Technologies

Introduction

Hiroki Yonemitsu is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of polymer materials, holding a total of 7 patents. His innovative work focuses on methods for pattern formation and data correction in microphase-separated polymer materials.

Latest Patents

Yonemitsu's latest patents include a guide pattern data correcting method, a pattern forming method, and a computer-readable record medium. The guide pattern data correcting method is designed to correct guide pattern data of a physical guide used for the formation of a polymer material that is to be microphase-separated. This method involves correcting the guide pattern data by shifting or rotating at least one of two connected concave portions within the guide pattern. The lithography pattern forming method utilizes self-organizing block copolymers, where a guide mask layer is formed with features of varying opening widths. This method allows for the phase-separation of a self-organizing material into distinct polymer portions, facilitating advanced pattern formation.

Career Highlights

Throughout his career, Hiroki Yonemitsu has worked with notable companies such as Kabushiki Kaisha Toshiba and Toshiba Memory Corporation. His experience in these organizations has contributed to his expertise in polymer technologies and innovation.

Collaborations

Yonemitsu has collaborated with talented individuals in his field, including Yusuke Kasahara and Ayako Kawanishi. These collaborations have further enhanced his research and development efforts.

Conclusion

Hiroki Yonemitsu is a distinguished inventor whose work in polymer material technologies has led to several important patents. His innovative methods and collaborations continue to influence advancements in the field.