The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Dec. 13, 2016
Applicant:
Toshiba Memory Corporation, Minato-ku, Tokyo, JP;
Inventor:
Hiroki Yonemitsu, Kawasaki, JP;
Assignee:
Toshiba Memory Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/40 (2006.01); G03F 7/38 (2006.01); B81C 1/00 (2006.01); G03F 7/00 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G06F 17/5072 (2013.01); B81C 1/00031 (2013.01); B82Y 40/00 (2013.01); G03F 7/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); B81C 2201/0149 (2013.01);
Abstract
According to one embodiment, a guide pattern data correcting method is for correcting guide pattern data of a physical guide for formation of a polymer material to be microphase-separated. The physical guide has a plurality of concave portions in the guide pattern data, and at least two concave portions out of the plurality of concave portions are connected to each other. The guide pattern data is subjected to correction by shifting or rotation of at least either of the two connected concave portions.