Location History:
- Kawasaki, JP (1999 - 2002)
- Shizuoka, JP (2012)
- Numazu, JP (2013)
- Kanagawa, JP (2015 - 2017)
- Kamakura, JP (2017 - 2019)
Company Filing History:
6 out of 716 
4 out of 52,735 
1 out of 2,529 
Years Active: 1999-2019
Title: The Innovative Mind of Hirohito Anze
Introduction
Hirohito Anze, an accomplished inventor based in Kamakura, Japan, has made significant contributions to the field of charged particle beam technologies. With an impressive portfolio of 10 patents to his name, Anze continues to push the boundaries of innovation, particularly in methods pertaining to substrate treatment and patterned writing.
Latest Patents
Among his latest inventions, Anze has developed a charged particle beam writing method that enhances pattern writing on substrates. In this method, a first pattern is written statically on a substrate with a Charge Dissipation Layer (CDL). The process involves calculating correction coefficients based on the positions of the written patterns, ensuring precision in subsequent patterning on both CDL and non-CDL substrates. Additionally, he has patented a method for forming a resist film, which utilizes a combination of spin coating and protective film application, enabling intricate layering and exposure processes that are crucial for advanced semiconductor manufacturing.
Career Highlights
Hirohito Anze has had a distinguished career, having worked with prominent companies such as Nuflare Technology, Inc. and Kabushiki Kaisha Toshiba. His work has not only contributed to technological advancements in these organizations but has also positioned him as a key figure in the development of innovative solutions within the semiconductor industry.
Collaborations
Throughout his career, Anze has collaborated with notable professionals such as Takashi Kamikubo and Takayuki Abe. These collaborations have fostered an environment of innovation and knowledge-sharing, allowing for the development of pioneering technologies that have pushed the industry forward.
Conclusion
Hirohito Anze is a testament to the power of innovation and collaboration in technology. With a focus on charged particle beam methods and substrate treatments, his work has paved the way for advancements in semiconductor processes. As he continues to innovate, the impact of his inventions will likely resonate within the industry for years to come.