Narashino, Japan

Hiroaki Tanaka


Average Co-Inventor Count = 2.7

ph-index = 5

Forward Citations = 60(Granted Patents)


Location History:

  • Funabashi, JP (1990 - 1994)
  • Narashino, JP (1989 - 2001)

Company Filing History:


Years Active: 1989-2001

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7 patents (USPTO):Explore Patents

Title: Hiroaki Tanaka: Innovator in Polishing Compounds

Introduction

Hiroaki Tanaka is a notable inventor based in Narashino, Japan. He has made significant contributions to the field of polishing compounds, holding a total of 7 patents. His work focuses on developing advanced materials that enhance the polishing process in various applications.

Latest Patents

Tanaka's latest patents include innovative formulations for polishing compounds. One of his inventions is a polishing compound in the form of a dispersion containing silicon oxide particles with an average diameter of 8 to 500 nanometers, along with metal compound particles selected from metal oxides, metal nitrides, and metal carbides. The concentration of silicon oxide particles ranges from 1 to 15 wt. %, while the metal compound particles are present at a concentration of 0.1 to 10 wt. %. The pH of this dispersion is maintained between 8.3 and 11.5, utilizing a buffering combination of weak acids and/or weak bases. Another patent describes a polishing compound comprising a colloidal solution with similar silicon oxide particle specifications, prepared as a buffer solution with a pH of 8.7 to 10.6.

Career Highlights

Throughout his career, Hiroaki Tanaka has worked with prominent companies such as Onoda Cement Co., Ltd. and Speedfam Co., Ltd. His experience in these organizations has contributed to his expertise in the development of polishing technologies.

Collaborations

Tanaka has collaborated with notable colleagues, including Akitoshi Yoshida and Yoshihisa Ogawa. These partnerships have likely fostered innovation and advancements in their respective fields.

Conclusion

Hiroaki Tanaka's contributions to the field of polishing compounds demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in polishing technology.

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