The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2001

Filed:

May. 06, 1999
Applicant:
Inventor:

Hiroaki Tanaka, Narashino, JP;

Assignee:

Speedfam Co Ltd, Kanagawa-pref, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ; C09K 3/14 ; C09G 1/02 ;
U.S. Cl.
CPC ...
B24B 1/00 ; C09K 3/14 ; C09G 1/02 ;
Abstract

A polishing compound in the form of a dispersion containing silicon oxide particles having an average diameter of 8 to 500 manometers and at least one kind of metal compound particles having an average diameter of 10 to 3000 nanometers and selected from metal oxides, metal nitrides and metal carbides. The concentration of silicon oxide particles is 1 to 15 wt. %. The concentration of silicon oxide particles is 0.1 to 10 wt. %. The pH of the dispersion is 8.3 to 11.5, and is buffered by the addition of a buffering combination composed of weak acid and/or weak base, wherein the logarithms of reciprocal number of acid dissociation constant at 25° C. of the weak acid and/or weak base is 8.0 to 12.5.


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