Toyama, Japan

Hiroaki Okuyama


Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2014-2017

Loading Chart...
4 patents (USPTO):Explore Patents

Title: Unveiling the Innovations of Hiroaki Okuyama in Semiconductor Technology

Introduction:

Hiroaki Okuyama, a pioneering inventor in semiconductor technology, hails from Toyama, Japan. With a remarkable portfolio of 4 patents, Okuyama has made significant contributions to the field of lithography and semiconductor device production. Let's delve into his latest patents and career highlights to uncover the brilliance behind his innovations.

Latest Patents:

1. Resist underlayer film forming composition for lithography containing polyether structure-containing resin: Okuyama's patent focuses on a method for producing a semiconductor device by utilizing a unique resist underlayer film forming composition. This composition includes a polymer with a distinct unit structure, enhancing the efficiency and precision of semiconductor substrate processing.

2. Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin: Another cutting-edge invention by Okuyama, this patent introduces a composition with superior heat resistance for forming a resist underlayer film in semiconductor device production. The composition comprises a polymer with specific unit structures, optimizing the lithography process.

Career Highlights:

Hiroaki Okuyama excels in his role at Nissan Chemical Industries Limited, a renowned company in the realm of semiconductor materials and technologies. His expertise and dedication have been instrumental in driving innovative solutions for semiconductor device manufacturing, solidifying his reputation as a trailblazer in the industry.

Collaborations:

Okuyama's collaborative spirit is evident through his partnerships with esteemed colleagues such as Tetsuya Shinjo and Keisuke Hashimoto. Together, they have collectively contributed to groundbreaking research and development initiatives, further elevating the standards of semiconductor innovation.

Conclusion:

In conclusion, Hiroaki Okuyama stands as a pivotal figure in the realm of semiconductor technology, with a legacy marked by groundbreaking patents and collaborative endeavors. His inventive spirit and unwavering commitment to excellence continue to inspire advancements in lithography and semiconductor device production, shaping the future of the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…