The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Jan. 04, 2013
Nissan Chemical Industries, Ltd., Tokyo, JP;
Daigo Saito, Funabashi, JP;
Hiroaki Okuyama, Toyama, JP;
Hideki Musashi, Funabashi, JP;
Tetsuya Shinjo, Toyama, JP;
Keisuke Hashimoto, Toyama, JP;
Nissan Chemical Industries, Ltd., Tokyo, JP;
Abstract
There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): wherein each of R, R, R, and Rmay be a hydrogen atom, Rmay be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.