Location History:
- Funabashi, JP (2013 - 2018)
- Toyama, JP (2021 - 2024)
Company Filing History:
8 out of 1,235 
3 out of 217 
Years Active: 2013-2025
Title: Daigo Saito: Innovator in Resist Underlayer Film-Forming Compositions
Introduction
Daigo Saito is a prominent inventor based in Funabashi, Japan. He has made significant contributions to the field of resist underlayer film-forming compositions, holding a total of 11 patents. His innovative work has advanced the technology used in lithography and semiconductor manufacturing.
Latest Patents
One of Daigo Saito's latest patents is a resist underlayer film-forming composition comprising an epoxy adduct having a long-chain alkyl group. This composition allows for the formation of a coating film with high flattening properties on a substrate. The epoxy adduct is created by reacting an epoxy group-containing compound with an epoxy adduct-forming compound, which may contain an optionally branched alkyl group with three or more carbon atoms.
Another notable patent involves a resist underlayer film-forming composition containing indolocarbazole novolak resin. This composition is designed for lithography and does not cause intermixing with a resist layer. It exhibits high dry etching resistance and heat resistance while generating a low amount of sublimate. The polymer used in this composition has a unit structure derived from a compound with a condensed ring structure and an aromatic group.
Career Highlights
Daigo Saito has worked with notable companies such as Nissan Chemical Industries Limited and Nissan Chemical Corporation. His experience in these organizations