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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11169441 B1

PDFFull Text
Date of Patent:
Nov. 09, 2021

Filed:

Jul. 12, 2018

Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device

Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Daigo Saito, Toyama, JP;

Keisuke Hashimoto, Toyama, JP;

Rikimaru Sakamoto, Toyama, JP;

Assignee:

NISSAN CHEMICAL CORPORATION, Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Caleen O Sullivan

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 8/20 (2006.01); C09D 161/12 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01); H01L 21/308 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 8/20 (2013.01); C09D 161/12 (2013.01); H01L 21/0274 (2013.01); H01L 21/0277 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31133 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01);
Abstract

A resist underlayer film forming composition characterized by containing (A) a compound represented by formula (1) (in formula (1), independently, Rrepresents a C1 to C30 divalent group; each of Rto Rrepresents a C1 to C10 linear, branched, or cyclic alkyl group, a C6 to C10 aryl group, a C2 to C10 alkenyl group, a thiol group, or a hydroxyl group; at least one Ris a hydroxyl group or a thiol group; each of m, m, and mis an integer of 0 to 9; each of mand mis an integer of 0 to 8; mis an integer of 1 to 9; n is an integer of 0 to 4; and each of pto pis an integer of 0 to 2) and a cross-linkable compound represented by formula (2-1) or (2-2) (in formula (2), Qrepresents a single bond or an m-valent organic group; each of Rand Rindependently represents a C2 to C10 alkyl group or a C2 to C10 alkyl group having a C1 to C10 alkoxy group; each of Rand Rrepresents a hydrogen atom or a methyl group; each of Rand Rrepresents a C1 to C10 alkyl group or a C6 to C40 aryl group; nis an integer of 1 to 3; nis an integer of 2 to 5; nis an integer of 0 to 3; nis an integer of 0 to 3, with these ns having a relationship of 3≤(n+n+n+n)≥6; nis an integer of 1 to 3; nis an integer of 1 to 4; nis an integer of 0 to 3; nis an integer of 0 to 3, with these ns having a relationship of 2≤(n+n+n+n)≤5; and mis an integer of 2 to 10).

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