The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2022
Filed:
Aug. 28, 2017
Nissan Chemical Corporation, Tokyo, JP;
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
Abstract
A material to form a resist underlayer film having properties achieving heat resistance, flattening properties, and etching resistance through lithography. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): (wherein Ris an organic group having at least two amines and at least three Caromatic rings, Rand Rare each a hydrogen atom, a Calkyl group, a Caryl group, a heterocyclic group, or a combination thereof, and the alkyl group, the aryl group, and the heterocyclic group are optionally substituted with a halogen group, a nitro group, an amino group, a formyl group, an alkoxy group, or a hydroxy group, or Rand Roptionally form a ring together). The above mentioned composition t, wherein Ris a divalent organic group derived from N,N'-diphenyl-1,4-phenylenediamine.