The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2024

Filed:

Feb. 20, 2019
Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Hirokazu Nishimaki, Toyama, JP;

Daigo Saito, Toyama, JP;

Ryo Karasawa, Toyama, JP;

Keisuke Hashimoto, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08L 61/06 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08L 61/06 (2013.01); G03F 7/168 (2013.01); G03F 7/2037 (2013.01); H01L 21/0275 (2013.01);
Abstract

A resist underlayer film-forming composition including a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three Caromatic rings and a vinyl group of an aromatic vinyl compound (B). The structural group (C) may be a group of the following Formula (1): [wherein Ris a divalent group containing at least two amino groups and at least three Caromatic rings]. Rmay be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of a compound of the following Formula (2): Rmay be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of N,N'-diphenyl-1,4-phenylenediamine.


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