The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Jul. 08, 2016
Nissan Chemical Industries, Ltd., Tokyo, JP;
Hiroaki Okuyama, Toyama, JP;
Yasunobu Someya, Toyama, JP;
Masakazu Kato, Toyama, JP;
Tetsuya Shinjo, Toyama, JP;
Keisuke Hashimoto, Toyama, JP;
NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;
Abstract
A method for producing a semiconductor device, which includes forming an underlayer film on a semiconductor substrate with a resist underlayer film forming composition that contains a solvent, and a polymer containing a unit structure of Formula (2):O—Ar—O—Ar-T-Ar  Formula (2)where Ar, Ar, and Arare individually a Carylene group or an organic group containing a heterocyclic group; at least one of Arand Aris a phenylene group; and T is a carbonyl group. The resist underlayer film forming composition has a solid content of 0.1 to 70 mass % of a total mass of the composition.