Nagoya, Japan

Hiroaki Himi


Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 350(Granted Patents)


Company Filing History:


Years Active: 1995-2010

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17 patents (USPTO):Explore Patents

Title: Hiroaki Himi: Innovator in Semiconductor Technology

Introduction

Hiroaki Himi is a prominent inventor based in Nagoya, Japan, known for his significant contributions to semiconductor technology. With a total of 17 patents to his name, Himi has made remarkable advancements in the field, particularly in the design and manufacturing of semiconductor devices.

Latest Patents

Himi's latest patents include a semiconductor device with a trench structure. This innovative device features a common diffusion structure formed in each region of a substrate where semiconductor components are created. The diffusion structures are separated by trenches, which define the sizes of the semiconductor components and isolate them from the surrounding area. Another notable patent is a method for manufacturing a semiconductor substrate. This method involves forming an epitaxial layer on a high-resistance semiconductor substrate containing interstitial oxygen at a high concentration. A subsequent heat treatment at high temperatures in an oxidizing atmosphere results in the formation of a stratiform region of SiO at the interface between the epitaxial layer and the semiconductor substrate. This process allows for the manufacturing of an apparent SOI substrate for an SOI semiconductor device at a low cost.

Career Highlights

Throughout his career, Himi has worked with notable companies such as Denso Corporation and Nippondenso Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Himi has collaborated with esteemed colleagues, including Seiji Fujino and Noriyuki Iwamori. These partnerships have further enhanced his work and contributions to the field of semiconductor devices.

Conclusion

Hiroaki Himi's innovative work in semiconductor technology has led to significant advancements in the industry. His patents and collaborations reflect his dedication to improving semiconductor devices and manufacturing processes.

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