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For the Inventor, By the Inventor

Nirasaki, Japan

Hideki Tanaka

This inventor holds 7 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2007-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Tanaka. Retrieved from https://idiyas.com/inventor/hideki-tanaka-sbmbyonx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 59(Granted Patents)


Location History:

  • Nirasaki, JP (2007 - 2009)
  • Yamanashi, JP (2007 - 2009)

Company Filing History:

goldMedal7 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2007-2009

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7 patents (USPTO):Explore Patents
1. 7637143 - Substrate processing apparatus and analysis method therefor (2009-12-29),
2. 7630064 - Prediction method and apparatus for substrate processing apparatus (2009-12-08),
3. 7505879 - Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus (2009-03-17),
4. 7389203 - Method and apparatus for deciding cause of abnormality in plasma processing apparatus (2008-06-17),
5. 7341954 - Method and apparatus for determining an operation status of a plasma processing apparatus, program and storage medium storing same (2008-03-11),
6. 7231321 - Method of resetting substrate processing apparatus, storage medium storing program for implementing the method, and substrate processing apparatus (2007-06-12),
7. 7217942 - Plasma leak monitoring method, plasma processing apparatus and plasma processing method (2007-05-15),

Title: Innovations by Hideki Tanaka

Introduction

Hideki Tanaka is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 7 patents. His work focuses on improving the efficiency and accuracy of substrate processing apparatuses.

Latest Patents

Tanaka's latest patents include a substrate processing apparatus and an analysis method for accurately detecting the state within a housing chamber. This innovative analysis method measures the emission intensities of processing gas before and after it passes through the chamber. By comparing these measurements, Tanaka's method can effectively determine the end point of plasma processing on wafers. Another notable patent is a prediction method and apparatus for substrate processing, which predicts processing results based on operation data collected during the processing of a target substrate. This method utilizes multivariate analysis and moving averages to enhance the accuracy of predictions.

Career Highlights

Tanaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing substrate processing technologies.

Collaborations

Tanaka has collaborated with notable coworkers, including Yoshihiro Yamazaki and Masayuki Tomoyasu. Their combined expertise has contributed to the development of innovative solutions in substrate processing.

Conclusion

Hideki Tanaka's contributions to substrate processing technology have made a significant impact in the field. His innovative patents and collaborative efforts continue to drive advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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