The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Nov. 10, 2005
Hajime Furuya, Nirasaka, JP;
Hideki Tanaka, Nirasaki, JP;
Tomoya Okubo, Nirasaki, JP;
Ryoko Kobayashi, Nirasaki, JP;
Hajime Furuya, Nirasaka, JP;
Hideki Tanaka, Nirasaki, JP;
Tomoya Okubo, Nirasaki, JP;
Ryoko Kobayashi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of resetting a substrate processing apparatus having a chamber which is capable of carrying out abnormality judgment on the substrate processing apparatus accurately without causing a decrease in the utilization ratio of the substrate processing apparatus. The chamber is evacuated. A temperature in the chamber is set. Whether or not there is an abnormality in the chamber is judged. An atmosphere in the chamber is stabilized so as to conform to predetermined processing conditions. At least one selected from data that change in response to a change in a state inside the chamber is measured. The measured data is compared with reference data that corresponds to the measured data for a normal state in the chamber.