The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2009
Filed:
Dec. 06, 2004
Masayuki Tomoyasu, Yamanashi, JP;
Hin OH, Shanghai, CN;
Hideki Tanaka, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
According to the present invention, multivariate analysis model expressions are generated for a plasma processing apparatusA and a plasma processing apparatusB by executing a multivariate analysis of detection data provided by a plurality of sensors included in each plasma processing apparatus when the plasma processing apparatusesA andB operate based upon first setting data. Then, when the plasma processing apparatusA operates based upon new second setting data, detection data provided by the plurality of sensors in the plasma processing apparatusA are used to generate a corresponding multivariate analysis model expression, and by using the new multivariate analysis model expression corresponding to the plasma processing apparatusA generated based upon the second setting data and to the plasma processing apparatusB, a multivariate analysis model expression corresponding to the new second setting data is generated four the plasma processing apparatusB.