Nirasaki, Japan

Hin Oh

This inventor holds 3 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2006-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hin Oh. Retrieved from https://idiyas.com/inventor/hin-oh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 63(Granted Patents)


Location History:

  • Nirasaki, JP (2006)
  • Shanghai, CN (2009)

Company Filing History:


Years Active: 2006-2009

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3 patents (USPTO):Explore Patents

Title: Innovations of Inventor Hin Oh

Introduction

Hin Oh is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 3 patents to his name, his work focuses on enhancing the efficiency and effectiveness of processing apparatuses.

Latest Patents

Hin Oh's latest patents include innovative methods and devices that improve multivariate analysis in plasma processing. His patents are:

1. Method for generating multivariate analysis model expression for processing apparatus.

2. Method for executing multivariate analysis of processing apparatus.

3. Control device of processing apparatus and control system for processing apparatus.

These inventions utilize detection data from multiple sensors to create accurate models for plasma processing apparatuses, ensuring optimal performance based on varying settings.

Career Highlights

Hin Oh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in advancing the capabilities of plasma processing technologies.

Collaborations

Hin Oh collaborates with esteemed colleagues such as Yuichi Mimura and Masayuki Tomoyasu. Their combined expertise contributes to the innovative projects at Tokyo Electron Limited.

Conclusion

Hin Oh's contributions to plasma processing technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in processing apparatuses, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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