The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
Feb. 11, 2005
Hin OH, Nirasaki, JP;
Hideaki Sato, Nirasaki, JP;
Naoki Takayama, Nirasaki, JP;
Hisanori Sakai, Nirasaki, JP;
Yuichi Mimura, Nirasaki, JP;
Hin Oh, Nirasaki, JP;
Hideaki Sato, Nirasaki, JP;
Naoki Takayama, Nirasaki, JP;
Hisanori Sakai, Nirasaki, JP;
Yuichi Mimura, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a plasma processing method and apparatus for monitoring information on a plasma processing, a multivariate analysis is performed by using as analysis data detection values detected for each object to be processed from a plurality of detection devices disposed in the processing apparatus upon the plasma processing. At that time, for each of sections defined whenever a maintenance of the processing apparatus is carried out, the detection values detected by the detection devices in the respective sections are compensated through a compensation unit, and the compensated detection values are taken as the analysis data.