Kanagawa, Japan

Hideaki Masuda


Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2005)
  • Yokohama, JP (2009)
  • Kanagawa, JP (2006 - 2010)
  • New York City, NY (US) (2015)

Company Filing History:


Years Active: 2005-2015

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6 patents (USPTO):Explore Patents

Title: Innovations of Hideaki Masuda in Semiconductor Technology

Introduction

Hideaki Masuda is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

Masuda's latest patents include a method of manufacturing a semiconductor device that involves processes carried out without atmospheric exposure. This method includes forming wiring on a semiconductor substrate and creating a densified layer on the surface of the first insulating film. Additionally, he has developed a method for fabricating a semiconductor device that involves forming a dielectric film containing a porogen material and etching processes that enhance the device's performance.

Career Highlights

Throughout his career, Hideaki Masuda has worked with notable companies such as Kabushiki Kaisha Toshiba and Sony Corporation. His experience in these leading technology firms has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor manufacturing.

Collaborations

Masuda has collaborated with esteemed colleagues, including Hideshi Miyajima and Rempei Nakata. These partnerships have fostered a creative environment that has led to innovative solutions in the semiconductor industry.

Conclusion

Hideaki Masuda's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced electronic devices.

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