Klosterneuburg, Austria

Herbert Vonach


Average Co-Inventor Count = 3.7

ph-index = 5

Forward Citations = 143(Granted Patents)


Location History:

  • Klosterneuberg, AT (1995 - 1997)
  • Klosterneuburg, AT (1995 - 2011)

Company Filing History:


Years Active: 1995-2011

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10 patents (USPTO):Explore Patents

Title: Herbert Vonach: Innovator Extraordinaire in Particle Systems

Introduction:

Herbert Vonach, a renowned innovator in the field of particle systems, has made significant contributions to the realm of charged particle technology. Hailing from Klosterneuburg, Austria, Vonach has an impressive portfolio of patents and has played a crucial role in advancing particle-optical projection systems and particle multibeam lithography. In this article, we will delve into his latest patents, career highlights, notable collaborations, and acknowledge his remarkable contributions to the field.

Latest Patents:

Vonach's recent patents showcase his expertise in charged particle systems. One notable innovation is the Charged Particle System, which includes a particle source for generating a beam of charged particles. The system also features a particle-optical projection system that consists of a focusing first magnetic lens, a focusing electrostatic lens, and a controller for precise focusing power control. This patent highlights Vonach's ability to enhance the precision and control of charged particle beams in various applications.

Additionally, Vonach has made groundbreaking advancements in Particle Multibeam Lithography. His patent describes an apparatus that employs a multibeam optical system with individual sub-beam deflection units to correct imaging aberrations and position sub-beams during the writing process on a substrate surface. Notably, the patent emphasizes the achievement of a substantial demagnification of at least 20:1, resulting in high-resolution and accurate lithography.

Career Highlights:

Over the course of his career, Vonach has made significant contributions to the field of charged particle systems. He has been associated with esteemed companies such as IMS-Ionen Mikrofabrikations Systeme GmbH and IMS Nanofabrication GmbH. Vonach's expertise has been instrumental in developing cutting-edge technologies and pushing the boundaries of particle-based systems.

Collaborations:

Vonach's work has not been confined to individual endeavors but has also been marked by fruitful collaborations. He has worked with esteemed colleagues such as Gerhard Stengl and Alfred Chalupka, both renowned experts in their respective fields. These collaborations have fostered innovation and resulted in groundbreaking advancements in particle systems.

Conclusion:

Herbert Vonach's pioneering work in charged particle systems has undoubtedly made a significant impact in the field. With a remarkable repertoire of patents and notable collaborations, his expertise has helped pave the way for improved precision and control in particle-optical projection systems and particle multibeam lithography. Vonach's contributions exemplify the importance of relentless innovation and dedication to pushing the boundaries of scientific exploration in the realm of charged particle systems.

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