The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Aug. 17, 1999
Hans Loschner, Vienna, AT;
Gerhard Stengl, Wernberg, AT;
Herbert Vonach, Klosterneuburg, AT;
Elmar Platzgummer, Vienna, AT;
Hans Loschner, Vienna, AT;
Gerhard Stengl, Wernberg, AT;
Herbert Vonach, Klosterneuburg, AT;
Elmar Platzgummer, Vienna, AT;
IMS-Innenmikrofabrikations Systeme GmbH, Vienna, AT;
Abstract
In a particle multibeam lithography apparatus an illumination system () having a particle source () produces an illuminating beam () of electrically charged particles, and a multibeam optical system () positioned after the illumination system () and comprising at least one aperture plate having an array of a plurality of apertures to form a plurality of sub-beams focuses the sub-beams onto the surface of a substrate (), wherein for each sub-beam () a deflection unit () is positioned within the multibeam optical system and adapted to correct individual imaging aberrations of the respective sub-beam with respect to the desired target position and/or position the sub-beam during a writing process an the substrate surface. Preferably, for each sub-beam the respective aperture of the first aperture plate defines the size and shape of the sub-beam cross-section and the multibeam optical system produces a demagnified image of the aperture on the substrate surface, with a demagnification of at least 20:1.