Hematha K Wickramasinghe

Title: Hematha K Wickramasinghe: Innovator in Nano Imprint Lithography

Introduction

Hematha K Wickramasinghe is a prominent inventor based in San Jose, California. He has made significant contributions to the field of nano imprint lithography, holding a total of seven patents. His innovative work has advanced the capabilities of lithographic techniques, making them more efficient and precise.

Latest Patents

Wickramasinghe's latest patents include a pneumatic method and apparatus for nano imprint lithography having a conforming mask. This invention involves applying pneumatic pressure to either a semi-rigid mask or template and a resist-coated workpiece, allowing for the transfer of patterns from the mask to the workpiece. Another notable patent is a method and apparatus for direct referencing of the top surface of a workpiece during imprint lithography. This invention features an air bearing that mechanically references the workpiece's surface, coupled with a lithographic template.

Career Highlights

Wickramasinghe is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to collaborate with other talented individuals in the field, further enhancing his contributions to technology and innovation.

Collaborations

Some of his notable coworkers include Theodore Gerard Van Kessel and Matthew Earl Colburn. Their collaborative efforts have played a role in advancing the research and development of innovative lithographic techniques.

Conclusion

Hematha K Wickramasinghe's contributions to nano imprint lithography exemplify the spirit of innovation in technology. His patents and work at IBM continue to influence the field, showcasing the importance of collaboration and creativity in advancing scientific knowledge.