The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Nov. 19, 2004
Applicants:
Matthew E. Colburn, Hopewell Junction, NY (US);
Yves C. Martin, Ossining, NY (US);
Theodore G. Van Kessel, Millbrook, NY (US);
Hematha K. Wickramasinghe, San Jose, CA (US);
Inventors:
Matthew E. Colburn, Hopewell Junction, NY (US);
Yves C. Martin, Ossining, NY (US);
Theodore G. van Kessel, Millbrook, NY (US);
Hematha K. Wickramasinghe, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method (and apparatus) of replicating a pattern on a structure, includes using imprint lithography to replicate a pattern formed on a first structure onto a portion of a second structure.