The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Nov. 16, 2004
Applicants:
Matthew E. Colburn, Hopewell Junction, NY (US);
Yves C. Martin, Ossining, NY (US);
Theodore G. Van Kessel, Millbrook, NY (US);
Hematha K. Wickramasinghe, San Jose, CA (US);
Inventors:
Matthew E. Colburn, Hopewell Junction, NY (US);
Yves C. Martin, Ossining, NY (US);
Theodore G. van Kessel, Millbrook, NY (US);
Hematha K. Wickramasinghe, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method (and apparatus) for nano lithography, includes applying a pneumatic pressure to at least one of a surface of a semi-rigid mask or template and a portion of a surface of a resist-coated workpiece, and, by the applying of the pneumatic pressure, transferring a pattern from the mask to the workpiece.