The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Nov. 16, 2004
Matthew E. Colburn, Hopewell Junction, NY (US);
Yves C. Martin, Ossining, NY (US);
Theodore G. Van Kessel, Millbrook, NY (US);
Hematha K. Wickramasinghe, San Jose, CA (US);
Matthew E. Colburn, Hopewell Junction, NY (US);
Yves C. Martin, Ossining, NY (US);
Theodore G. van Kessel, Millbrook, NY (US);
Hematha K. Wickramasinghe, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method (and apparatus) for nano lithography, includes applying a pneumatic pressure to at least one of a surface of a semi-rigid mask or template and a portion of a surface of a resist-coated workpiece, and, by the applying of the pneumatic pressure, transferring a pattern from the mask to the workpiece.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile