Tokyo, Japan

Hayato Sawamoto

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Hayato Sawamoto: Innovator in Photosensitive Resin Technology

Introduction

Hayato Sawamoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin technology. His innovative work has led to the development of a unique photosensitive resin composition that has various applications in electronics.

Latest Patents

Hayato Sawamoto holds 1 patent related to a photosensitive resin composition, photosensitive resin film, printed wiring board, semiconductor package, and method for producing printed wiring board. This invention focuses on providing a photosensitive resin composition that includes a photopolymerizable compound with an ethylenically unsaturated group and an acidic substituent. Additionally, it incorporates a photopolymerization initiator, with at least one component containing a dicyclopentadiene structure.

Career Highlights

Hayato Sawamoto is currently associated with Resonac Corporation, where he continues to push the boundaries of innovation in his field. His work has been instrumental in advancing technologies that are crucial for modern electronics.

Collaborations

Throughout his career, Hayato has collaborated with notable colleagues, including Akihiro Nakamura and Yuji Takase. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Hayato Sawamoto's contributions to photosensitive resin technology exemplify the spirit of innovation. His work not only enhances the capabilities of electronic components but also paves the way for future advancements in the industry.

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