The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Jul. 05, 2021
Applicant:

Showa Denko Materials Co., Ltd., Tokyo, JP;

Inventors:

Hayato Sawamoto, Tokyo, JP;

Shuji Nomoto, Tokyo, JP;

Akihiro Nakamura, Tokyo, JP;

Kohei Otsuka, Tokyo, JP;

Yuya Akiyama, Tokyo, JP;

Assignee:

RESONAC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/028 (2006.01); C08K 3/013 (2018.01); H01L 21/48 (2006.01); H01L 23/498 (2006.01); H05K 1/03 (2006.01); H05K 3/38 (2006.01); H05K 3/10 (2006.01); H05K 3/18 (2006.01); H05K 3/42 (2006.01);
U.S. Cl.
CPC ...
G03F 7/028 (2013.01); C08K 3/013 (2018.01); H01L 21/481 (2013.01); H01L 23/49894 (2013.01); H05K 1/0373 (2013.01); H05K 3/389 (2013.01); H01L 23/49822 (2013.01); H05K 3/108 (2013.01); H05K 3/18 (2013.01); H05K 3/423 (2013.01); H05K 2201/0239 (2013.01); H05K 2201/209 (2013.01); H05K 2203/072 (2013.01); H05K 2203/0723 (2013.01);
Abstract

Provided is a photosensitive resin composition containing: a photopolymerizable compound (A) having an ethylenically unsaturated group; a photopolymerization initiator (B); and an inorganic filler (F), in which the photopolymerizable compound (A) having an ethylenically unsaturated group includes a photopolymerizable compound (A1) having an acidic substituent and an alicyclic structure together with an ethylenically unsaturated group, and the inorganic filler (F) includes an inorganic filler surface-treated with a coupling agent without at least one functional group selected from the group consisting of an amino group and a (meth)acryloyl group. The present disclosure also provides a photosensitive resin composition for photo via formation, and a photosensitive resin composition for interlayer insulating layer. The present disclosure further provides: a photosensitive resin film and a photosensitive resin film for interlayer insulating layer, each of which contains the photosensitive resin composition; a multilayered printed wiring board and a semiconductor package; and a method for producing a multilayered printed wiring board.


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