Location History:
- Kanagawa, JP (2007 - 2010)
- Naka-gun, JP (2013)
- Chigasaki, JP (2012 - 2015)
Company Filing History:
5 out of 441 
1 out of 278 
1 out of 6,661 
Years Active: 2007-2015
Title: Hajime Nakamura: Innovator in Sputtering Technology
Introduction
Hajime Nakamura is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 7 patents. His innovative work focuses on improving the efficiency and effectiveness of deposition processes in various applications.
Latest Patents
Nakamura's latest patents include a dummy substrate designed for use in an inline reactive sputtering apparatus. This dummy substrate features a rectangular-plate-like frame structure with an opening in a metal plate. It is engineered to cover the contact portion of a carrier, preventing undesirable situations such as glass cracking during operation. This design allows for increased usage of the dummy substrate while preventing the deposition of unwanted substances on the carrier. Additionally, he has developed a conveyor and deposition apparatus that optimizes the installation area and enhances the efficiency of the deposition process.
Career Highlights
Throughout his career, Hajime Nakamura has worked with notable companies such as Ulvac, Inc. and Chi Mei Optoelectronics Corporation. His experience in these organizations has contributed to his expertise in sputtering technology and deposition methods.
Collaborations
Nakamura has collaborated with talented individuals in his field, including Koji Ishino and Takaaki Shindou. These partnerships have fostered innovation and advancements in the technologies he has developed.
Conclusion
Hajime Nakamura's contributions to sputtering technology and his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in deposition processes, showcasing his dedication to improving technology.