Vertical substrate transfer apparatus and film-forming apparatus

Abstract

To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation, and capable of supporting and carrying the substrate without interfering with a non-film-forming surface. A film-forming apparatus () according to the present invention includes a carrier () giving support so that either surface of a substrate (W) is processable, a first position changing section () changing a carrying position of the carrier (), and a carrying chamber () housing the carrier, whose position is changed therein and which carries the carrier to a film-forming chamber (). With the above construction, it becomes possible to subject either surface to film-forming processing regardless of the carrying position of the substrate (W). Further, it becomes possible to change a film-forming surface (Wa) in the course of carrying the substrate (W). Furthermore, it becomes possible to support the substrate (W) without causing the carrier () to interfere with a non-film-forming surface of the substrate (W).