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For the Inventor, By the Inventor

Furlong, PA, United States of America

Guangyun Zhang

USPTO Granted Patents = 12

Average Co-Inventor Count = 4.0

ph-index = 3

Forward Citations = 23(Granted Patents)


Company Filing History:

goldMedal12 out of 309 
 
Rohm and Haas Electronic Materials Cmp Holdings, Inc.
 patents

Years Active: 2011-2014

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12 patents (USPTO):Explore Patents
1. 8865013 - Method for chemical mechanical polishing tungsten (2014-10-21),
2. 8790160 - Chemical mechanical polishing composition and method for polishing phase change alloys (2014-07-29),
3. 8568610 - Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate (2013-10-29),
4. 8513126 - Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate (2013-08-20),
5. 8496843 - Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride (2013-07-30),
6. 8492277 - Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride (2013-07-23),
7. 8491808 - Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride (2013-07-23),
8. 8444728 - Stabilized chemical mechanical polishing composition and method of polishing a substrate (2013-05-21),
9. 8431490 - Method of chemical mechanical polishing a substrate with polishing composition adapted to enhance silicon oxide removal (2013-04-30),
10. 8309468 - Chemical mechanical polishing composition and method for polishing germanium-antimony-tellurium alloys (2012-11-13),
11. 8232208 - Stabilized chemical mechanical polishing composition and method of polishing a substrate (2012-07-31),
12. 8025813 - Chemical mechanical polishing composition and methods relating thereto (2011-09-27),

Title: Innovations of Guangyun Zhang

Introduction

Guangyun Zhang is a prominent inventor based in Furlong, PA, known for his significant contributions to the field of chemical mechanical polishing. With a total of 12 patents to his name, Zhang has made remarkable advancements in polishing technologies that are essential for various applications in electronics and materials science.

Latest Patents

Zhang's latest patents include a method for chemical mechanical polishing tungsten, which involves a nonselective chemical mechanical polishing composition. This innovative method enhances the efficiency of polishing substrates made of tungsten. Another notable patent is for a chemical mechanical polishing composition and method for polishing phase change alloys. This method focuses on substrates comprising a germanium-antimony-tellurium chalcogenide phase change alloy (GST) and utilizes a specialized composition that includes water, abrasives, and various chemical agents to achieve a high GST removal rate with minimal defects.

Career Highlights

Zhang has established a successful career at Rohm and Haas Electronic Materials CMP Holdings, Inc., where he has been instrumental in developing advanced polishing techniques. His work has significantly impacted the manufacturing processes in the electronics industry, particularly in the production of semiconductors and other high-tech materials.

Collaborations

Zhang collaborates with talented professionals in his field, including Yi Guo and Kancharla-Arun Kumar Reddy. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Guangyun Zhang's contributions to the field of chemical mechanical polishing demonstrate his expertise and commitment to innovation. His patents reflect a deep understanding of materials science and a dedication to improving manufacturing processes. Zhang's work continues to influence the industry and pave the way for future advancements.

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