The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2014
Filed:
Aug. 15, 2011
Applicants:
Yi Guo, Newark, DE (US);
Jerry Lee, Newark, DE (US);
Raymond L. Lavoie, Jr., Millsboro, DE (US);
Guangyun Zhang, Furlong, PA (US);
Inventors:
Yi Guo, Newark, DE (US);
Jerry Lee, Newark, DE (US);
Raymond L. Lavoie, Jr., Millsboro, DE (US);
Guangyun Zhang, Furlong, PA (US);
Assignee:
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); C09G 1/02 (2006.01); C09K 13/00 (2006.01); H01L 21/768 (2006.01); H01L 21/321 (2006.01); C09K 3/14 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 21/7684 (2013.01); H01L 21/3212 (2013.01); H01L 21/31053 (2013.01); C09K 3/1463 (2013.01);
Abstract
A method for chemical mechanical polishing of a substrate comprising tungsten using a nonselective chemical mechanical polishing composition.