The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Jun. 12, 2012
Yi Guo, Newark, DE (US);
Zhendong Liu, King of Prussia, PA (US);
Kancharla-arun Kumar Reddy, Bear, DE (US);
Guangyun Zhang, Furlong, PA (US);
Yi Guo, Newark, DE (US);
Zhendong Liu, King of Prussia, PA (US);
Kancharla-Arun Kumar Reddy, Bear, DE (US);
Guangyun Zhang, Furlong, PA (US);
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Abstract
A chemical mechanical polishing composition, comprising, as initial components: water; 0.1 to 20 wt % abrasive having an average particle size of 5 to 50 nm; and, 0.001 to 1 wt % of an adamantyl substance according to formula (II): wherein A is selected from N and P; wherein each Ris independently selected from hydrogen, a saturated or unsaturated Calkyl group, Caryl group, Caralkyl group, Calkaryl group; and, wherein the anion in formula (II) can be any anion that balances the positive charge on the cation in formula (II).