Guangyang Wang

Title: Innovations by Guangyang Wang in Semiconductor Technology

Introduction

Guangyang Wang is a notable inventor based in Jiangsu, China, recognized for his contributions to semiconductor technology. With a total of five patents to his name, Wang has made significant advancements in the field, particularly in enhancing device performance and protection.

Latest Patents

One of his latest patents involves a semiconductor device that includes a semiconductor substrate, a field oxide layer, a gate region, and a field plate integrated structure along with multiple contact holes. This innovative design features a body region and a drift region formed within the semiconductor substrate. An active region is established in the body region, while a drain region is created in the drift region. The field oxide layer is strategically positioned on the drift region, which surrounds part of the field oxide layer. Additionally, the integrated structure comprising the gate region and field plate extends from above the field oxide layer to above the body region. Notably, the depth of a contact hole closer to the source region is greater than that of a contact hole nearer to the drain region.

Another significant patent focuses on a semiconductor device designed to enhance electrostatic discharge (ESD) protection and its corresponding layout structure. This invention features an ESD protection device and a protected device with a small feature linewidth, both situated on the same well region. The device with the small feature linewidth is centrally located, flanked by the ESD protection device on either side.

Career Highlights

Guangyang Wang has worked with prominent companies in the semiconductor industry, including CSMC Technologies Fab2 Co., Ltd. and CSMC Technologies Fab1 Co., Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Wang has collaborated with notable colleagues such as Zhongyu Lin and Yonghai Hu, further enhancing his work in the field.

Conclusion

Guangyang Wang's contributions to semiconductor technology through his innovative patents demonstrate his significant impact on the industry. His work continues to influence advancements in device performance and protection mechanisms.