Company Filing History:
Years Active: 2000-2012
Title: Innovations of Guangcai Xing: Pioneering Thin Oxide Films and Semiconductor Technologies
Introduction
Guangcai Xing is a notable inventor based in Fremont, California, recognized for his contributions to the field of semiconductor technology. With a remarkable portfolio of seven patents, he has developed innovative methods and apparatuses that tackle complex challenges within the industry. His most recent patents focus on enhancing the efficiency of oxidation processes and advancing materials used in semiconductor devices.
Latest Patents
One of Guangcai Xing's latest inventions is a method and apparatus for growing thin oxide films on silicon while minimizing the impact on existing structures. This plasma-assisted low-temperature radical oxidation process offers selectivity to metals or metal oxides present alongside the silicon being oxidized. By properly selecting the process parameters, notably the ratio of hydrogen to oxygen gas, the innovation improves oxidation efficiency. Additionally, the enlargement of the process window through the injection of H2O steam into the plasma allows for silicon oxidation in the presence of titanium nitride (TiN) and tungsten (W) at relatively low temperatures.
Another significant patent introduced by Guangcai is a method for single wafer thermal chemical vapor deposition (CVD) processes for hemispherical grained silicon and nanocrystalline grain-sized polysilicon. This method involves depositing these layers in single substrate CVD chambers and presents a two-step deposition process to achieve a nanocrystalline grain-sized polysilicon layer with reduced roughness. These advancements hold promise for improved electrode layers in semiconductor devices.
Career Highlights
Guangcai Xing has had an illustrious career, having worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Mattson Technology, Inc. His work in these organizations reflects a commitment to driving forward innovation in semiconductor manufacturing processes.
Collaborations
Throughout his career, Guangcai has collaborated with notable individuals, including Gary Eugene Miner and David R Lopes. These partnerships have fostered an environment of creativity and innovation, leading to the successful development of cutting-edge technologies and patents.
Conclusion
Guangcai Xing's contributions to the field of semiconductor technology, especially through his recent patents, mark him as a significant figure in innovation. His work not only exemplifies technical excellence but also showcases the critical role inventors play in advancing modern technology and industry practices. As he continues to develop new methodologies, the impact of his inventions on the semiconductor landscape will undoubtedly grow.