The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Nov. 12, 1999
David B. Noble, Sunnyvale, CA (US);
Ravi Jallepally, Santa Clara, CA (US);
Nathan D'Astici, Campbell, CA (US);
Gary Miner, Fremont, CA (US);
Turgut Sahin, Cupertino, CA (US);
Guangcai Xing, Fremont, CA (US);
Yashraj Bhatnagar, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An apparatus and method for exposing a substrate to plasma including a first reaction chamber adapted to generate a plasma comprising ions and radicals and a second reaction chamber coupled to the first reaction chamber and adapted to house a substrate at a sight in the second reaction chamber. The second reaction chamber is coupled to the first reaction chamber by an inlet member and radicals of the plasma flow through the inlet member into the second reaction chamber.