Fremont, CA, United States of America

Gary Eugene Miner

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.9

ph-index = 10

Forward Citations = 422(Granted Patents)


Location History:

  • Newark, CA (US) (1997 - 2002)
  • Fremont, CA (US) (2001 - 2010)

Company Filing History:


Years Active: 1997-2010

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14 patents (USPTO):

Title: Gary Eugene Miner: Innovator in Semiconductor Technology

Introduction

Gary Eugene Miner is a prominent inventor based in Fremont, CA, known for his significant contributions to semiconductor technology. With a total of 14 patents to his name, Miner has made remarkable advancements in the field, particularly in the area of dielectric films and dopant activation methods.

Latest Patents

One of his latest patents is titled "Tailoring nitrogen profile in silicon oxynitride using rapid thermal annealing with ammonia under ultra-low pressure." This innovative method involves incorporating nitrogen into a dielectric film using a nitridation gas and a rapid thermal annealing process, utilizing an ultra-low pressure of equal to or less than about 10 Torr. Another notable patent is the "Gate electrode dopant activation method for semiconductor manufacturing." This invention provides a method for forming a doped silicon-containing material on a substrate, which includes depositing a polycrystalline layer on a dielectric layer and implanting it with a dopant to achieve specific concentrations.

Career Highlights

Gary Miner is currently employed at Applied Materials, Inc., where he continues to push the boundaries of semiconductor manufacturing. His work has been instrumental in developing methods that enhance the efficiency and effectiveness of semiconductor devices.

Collaborations

Throughout his career, Miner has collaborated with notable colleagues, including Mark Yam and Guangcai Xing, contributing to various projects that have advanced the field of semiconductor technology.

Conclusion

Gary Eugene Miner stands out as a key figure in the semiconductor industry, with a strong portfolio of patents that reflect his innovative spirit and dedication to advancing technology. His contributions continue to shape the future of semiconductor manufacturing.

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