Company Filing History:
Years Active: 1992-2002
Title: Unveiling the Innovations of David B Noble
Introduction:
David B Noble, a brilliant inventor hailing from Sunnyvale, CA, has left a mark in the field of semiconductor technology with his groundbreaking patents and innovative methods.
Latest Patents:
1. "Apparatus for exposing a substrate to plasma radicals": This patent describes an apparatus and method for exposing a substrate to plasma, aiding in the creation of ions and radicals necessary for various processes.
2. "Fabricating a semiconductor device with strained Si.sub.1-x Ge.sub.x": This patent unveils a method for fabricating devices with strained SiGe layers, enhancing their performance and functionality significantly.
Career Highlights:
David B Noble has contributed significantly to renowned companies such as Hewlett-Packard Company and Applied Materials, Inc., showcasing his expertise and prowess in the semiconductor industry.
Collaborations:
During his illustrious career, David had the pleasure of working alongside esteemed individuals like Theodore I Kamins and Judy L Hoyt, forming a dynamic team that drove innovation and progress forward.
Conclusion:
In conclusion, David B Noble's innovative spirit and dedication to pushing the boundaries of semiconductor technology have solidified his position as a pioneering figure in the industry. His patents and collaborations are a testament to his invaluable contributions to the field.