Beaverton, OR, United States of America

Gerald B Feldewerth

This inventor holds 2 USPTO granted patents. Top assignees: Intel Corporation, Novellus Systems Incorporated. Active years: 2004-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Gerald B Feldewerth. Retrieved from https://idiyas.com/inventor/gerald-b-feldewerth

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 50.0

Average Co-Inventor Count = 9.0

ph-index = 2

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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2 patents (USPTO):Explore Patents

Title: Gerald B Feldewerth: Innovator in Electroplating and Semiconductor Technologies

Introduction

Gerald B Feldewerth is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the fields of electroplating and semiconductor technologies. With a total of 2 patents, his work has had a lasting impact on the industry.

Latest Patents

Feldewerth's latest patents include innovative technologies that enhance the performance and reliability of electronic components. One of his patents focuses on an under bump metallization layer that enables the use of high tin content solder bumps. This invention includes an apparatus and methods for fabricating an under bump metallization structure, which consists of an adhesion layer, a molybdenum-containing barrier layer, a wetting layer, and high tin content solder material. The molybdenum-containing barrier layer is crucial as it prevents the movement of tin in the solder material from migrating to dielectric layers, thereby avoiding potential delamination and damage to underlying structures.

Another significant patent is for an anode and anode chamber designed for copper electroplating. This electroplating system features a phosphorized anode with a large average grain size and a plating apparatus that effectively separates the anode from the cathode. This separation is achieved through a microporous chemical transport barrier, which minimizes the transfer of particles generated at the anode to the cathode, thus preventing defects in the electroplated parts.

Career Highlights

Throughout his career, Gerald B Feldewerth has worked with prominent companies in the technology sector. He has held positions at Novellus Systems Incorporated and Intel Corporation, where he contributed to various projects that advanced semiconductor manufacturing processes.

Collaborations

Feldewerth has collaborated with several professionals in his field, including Jonathan David Reid and Timothy Mark Archer. These collaborations have further enriched his work and contributed to the development of innovative technologies.

Conclusion

Gerald B Feldewerth is a distinguished inventor whose contributions to electroplating and semiconductor technologies have significantly influenced the industry. His patents reflect a commitment to innovation and excellence in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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