Hirakata, Japan

Genshu Fuse


Average Co-Inventor Count = 2.0

ph-index = 11

Forward Citations = 523(Granted Patents)


Location History:

  • Osaka, JP (1991)
  • Toyonaka, JP (1993 - 1995)
  • Hirakata, JP (1984 - 2001)

Company Filing History:


Years Active: 1984-2001

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15 patents (USPTO):Explore Patents

Title: Genshu Fuse: Innovator in Semiconductor Technology

Introduction

Genshu Fuse is a prominent inventor based in Hirakata, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His innovative approaches have paved the way for advancements in semiconductor fabrication and evaluation.

Latest Patents

Among his latest patents is a method of fabricating a semiconductor device. This method involves several steps, including forming a trench on a semiconductor substrate and positioning the substrate at different angles to inject ions effectively. Another notable patent is for a crystal evaluation apparatus and method. This invention includes a cell region with an anode and cathode, designed for anodic oxidation and subsequent removal of the oxide film on a semiconductor substrate. The method allows for high-resolution observation of defects and impurity distribution on the substrate.

Career Highlights

Genshu Fuse has worked with notable companies such as Matsushita Electric Industrial Co., Ltd. and Matsushita Electronics Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Some of his coworkers include Takashi Ohzone and Toshio Yamada. Their collaboration has likely fostered a creative environment that encourages innovation in semiconductor research.

Conclusion

Genshu Fuse's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor fabrication and evaluation methods.

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