San Jose, CA, United States of America

Gene S Lee

USPTO Granted Patents = 20 


Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 342(Granted Patents)


Location History:

  • Las Vegas, NV (US) (2023)
  • San Jose, CA (US) (2001 - 2024)

Company Filing History:


Years Active: 2001-2025

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20 patents (USPTO):

Title: Gene S Lee: Innovator in Metal Etching Technologies

Introduction

Gene S Lee, based in San Jose, CA, is a notable inventor with a significant portfolio of 19 patents. His contributions to the field of semiconductor manufacturing, particularly in metal etching techniques, have advanced the industry and improved production processes.

Latest Patents

Among his most recent patents is a method for selective barrier metal etching. This innovative approach involves performing a hydrogen implantation process in an inductively coupled plasma (ICP) etch chamber to chemically reduce oxidized portions of a barrier metal layer. Following this, an etch process is carried out in the same chamber to remove the hydrogen-implanted portions of the barrier metal layer. Another notable patent is the spacer patterning process with a flat top profile, which details a method for forming metal-containing features. This method includes conformally depositing an over layer on top surfaces of a patterned mandrel layer and an over spacer layer on the sidewalls, followed by an etch process to remove specific portions using a fluorine-containing etching gas.

Career Highlights

Gene S Lee has made significant strides in his career, having worked with leading companies such as Applied Materials, Inc. and the Commissariat à l'Énergie Atomique et aux Énergies Alternatives. His expertise in etching technologies has earned him respect in the industry and recognition as a key contributor to several successful projects.

Collaborations

Throughout his career, Gene has collaborated with talented individuals, including Akhil Mehrotra and Shan Jiang. These partnerships have contributed to the successful development of innovative technologies and have facilitated the advancement of system capabilities in the semiconductor field.

Conclusion

Gene S Lee stands out as an influential inventor in metal etching technology. His patents and collaborations demonstrate a commitment to innovation that continues to shape the semiconductor manufacturing landscape. Gene's work exemplifies the crucial role of inventive minds in driving forward technological advancements.

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