Gaëlle Antoun

Title: Gaëlle Antoun: Innovator in Etching Technologies

Introduction

Gaëlle Antoun is a prominent inventor based in Dardilly, France. He has made significant contributions to the field of etching technologies, holding a total of three patents. His innovative approaches have advanced the methods used in substrate processing and etching.

Latest Patents

One of Gaëlle Antoun's latest patents is an etching method and etching apparatus. This method involves a physical adsorption process that adsorbs an adsorbate based on a first processing gas on a film to be etched. This process occurs under conditions where the pressure of the first processing gas is smaller than its saturated vapor pressure, while simultaneously cooling the object being processed. The etching process then reacts the adsorbate with the film using a plasma of a second processing gas. Another notable patent is for selective etching with fluorine, oxygen, and noble gas containing plasmas. This method includes loading a substrate into a plasma processing chamber and performing a cyclic plasma etch process. Each cycle generates a first plasma from a gas mixture of fluorosilane and oxygen, followed by a deposition step to form a passivation film, and concludes with an etch step using a second plasma from a noble gas mixture.

Career Highlights

Gaëlle Antoun has worked with notable companies such as Tokyo Electron Limited and Université d'Orléans. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge research in etching technologies.

Collaborations

Throughout his career, Gaëlle has collaborated with esteemed colleagues, including Shigeru Tahara and Jacques Faguet. These partnerships have fostered innovation and the exchange of ideas in the field.

Conclusion

Gaëlle Antoun's work in etching technologies exemplifies his commitment to innovation and advancement in substrate processing. His patents reflect a deep understanding of the complexities involved in etching methods, making him a significant figure in this field.