Kawasaki, Japan

Fumitake Mieno

This inventor holds 19 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: Fujitsu Corporation, 501 Fujitsu Limited, Vlsi. Active years: 1989-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fumitake Mieno. Retrieved from https://idiyas.com/inventor/fumitake-mieno-8wrjif9v

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 12

Forward Citations = 527(Granted Patents)


Company Filing History:


Years Active: 1989-2001

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Areas of Expertise:
Semiconductor Device
Doping Techniques
Chemical Vapor Deposition
Epitaxial Growth
Amorphous Silicon
Bipolar-MOS Devices
Silicon Carbide
Tungsten Film
Integrated Circuits
Wafer Heating
X-Ray Exposure Mask
Heteroepitaxial Thin Film
19 patents (USPTO):Explore Patents

Title: The Innovative Mind of Fumitake Mieno: A Pioneer in Semiconductor Fabrication

Introduction: Fumitake Mieno, an esteemed inventor based in Kawasaki, Japan, has made significant contributions to the field of semiconductor technology, holding a remarkable 19 patents to his name. His innovative approaches to semiconductor device fabrication have revolutionized various processes, ensuring enhanced performance and reliability in modern electronics.

Latest Patents: Mieno's most recent patents outline revolutionary methods for fabricating semiconductor devices. One notable patent involves a technique that deposits an amorphous silicon layer on a substrate and subsequently forms an oxidation film on its surface using an oxidation gas. This step of forming an oxidation film occurs prior to the crucial crystallization phase of the amorphous silicon layer, creating a more efficient device structure. Such innovative methods display Mieno's dedication to advancing semiconductor technology and improving device fabrication processes.

Career Highlights: Throughout his career, Fumitake Mieno has collaborated with leading companies in the tech industry, including Fujitsu Corporation and Fujitsu Limited. His work has not only garnered numerous patents but also established him as a notable figure in semiconductor research and development.

Collaborations: Mieno has worked alongside talented professionals, such as Yuji Furumura and Takashi Eshita, fostering a collaborative environment that emphasizes innovation and technological advancement. These partnerships have allowed for the sharing of ideas and techniques, contributing to the success of his patented inventions.

Conclusion: Fumitake Mieno's impact on semiconductor technology is evident through his extensive patent portfolio and innovative methods for device fabrication. His collaborations and experience with prominent companies have positioned him as a prominent inventor in the field. As technology continues to evolve, Mieno’s contributions are likely to remain at the forefront of semiconductor innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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