The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1992
Filed:
Feb. 24, 1989
Applicant:
Inventors:
Masao Yamada, Yokohama, JP;
Masafumi Nakaishi, Inagi, JP;
Kenji Nakagawa, Isehara, JP;
Yuji Furumura, Kawasaki, JP;
Takashi Eshita, Inagi, JP;
Fumitake Mieno, Kawasaki, JP;
Assignee:
501 Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; G03F / ;
U.S. Cl.
CPC ...
427249 ; 427255 ; 4272552 ; 430-5 ;
Abstract
A method of fabricating an X-ray exposure mask including the steps of forming a .beta.-SiC membrane by chemcial vapor deposition and simultaneously doping the membrane with at least one of phosphorous, boron, nitrogen and oxygen.