San Jose, CA, United States of America

Fuhong Zhang

USPTO Granted Patents = 38 

 

Average Co-Inventor Count = 4.5

ph-index = 10

Forward Citations = 906(Granted Patents)


Location History:

  • Cupertino, CA (US) (2007 - 2023)
  • San Jose, CA (US) (2017 - 2024)

Company Filing History:


Years Active: 2007-2025

where 'Filed Patents' based on already Granted Patents

38 patents (USPTO):

Title: Fuhong Zhang: A Pioneer in Semiconductor Processing Innovation

Introduction: Fuhong Zhang, based in San Jose, CA, is a commendable inventor known for his significant contributions to the field of semiconductor processing. With an impressive portfolio of 37 patents, Zhang has established himself as a key figure in advancing methodologies that enhance the efficiency and effectiveness of physical vapor deposition (PVD) processes.

Latest Patents: Amongst his recent innovations are groundbreaking methods for shaping magnetic fields during semiconductor processing. His latest patents include "Methods for Shaping Magnetic Fields During Semiconductor Processing," which outlines procedures for sputtering material in a PVD chamber using controlled magnetic fields. This approach ensures optimized material deposition on substrates, thereby improving overall processing quality. Additionally, his patent titled "Methods and Apparatus for Controlling Ion Fraction in Physical Vapor Deposition Processes" describes a sophisticated process chamber design with strategically placed magnets that facilitate the redistribution of ions over the substrate, enhancing the precision of semiconductor manufacturing.

Career Highlights: Fuhong Zhang's career is marked by his tenure at Applied Materials, Inc., a leader in semiconductor equipment manufacturing. His work has been integral to the development of advanced tools and technologies that are pivotal in the semiconductor industry. Through his innovative techniques, Zhang has played a crucial role in streamlining processes that are essential for producing high-quality electronic components.

Collaborations: Throughout his career, Zhang has collaborated with esteemed colleagues such as Martin Lee Riker and Zheng Wang. Their joint efforts have led to numerous developments that push the boundaries of semiconductor technology, showcasing the importance of teamwork in driving innovation forward.

Conclusion: Fuhong Zhang's contributions to semiconductor processing through his extensive patent portfolio highlight his dedication to innovation. As technology continues to evolve, his work remains foundational in shaping the future of the semiconductor industry, promising ongoing advancements that will benefit various sectors reliant on cutting-edge electronic components.

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