The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
May. 28, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Goichi Yoshidome, Albany, CA (US);
Suhas Bangalore Umesh, Sunnyvale, CA (US);
Sushil Arun Samant, Thane, IN;
Martin Lee Riker, Milpitas, CA (US);
Wei Lei, Campbell, CA (US);
Kishor Kumar Kalathiparambil, Santa Clara, CA (US);
Shirish A. Pethe, Cupertino, CA (US);
Fuhong Zhang, San Jose, CA (US);
Prashanth Kothnur, San Jose, CA (US);
Andrew Tomko, Redwood City, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods of processing a substrate in a PVD chamber are provided herein. In some embodiments, a method of processing a substrate in a PVD chamber, includes: sputtering material from a target disposed in the PVD chamber and onto a substrate, wherein at least some of the material sputtered from the target is guided to the substrate through a magnetic field provided by one or more upper magnets disposed about a processing volume of the PVD chamber above a support pedestal for the substrate in the PVD chamber, one or more first magnets disposed about the support pedestal and providing an increased magnetic field strength at an edge region of the substrate, and one or more second magnets disposed below the support pedestal that increase a magnetic field strength at a central region of the substrate.