The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2025

Filed:

Oct. 30, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Junjie Pan, Sunnyvale, CA (US);

Xiangjin Xie, Fremont, CA (US);

Fuhong Zhang, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3476 (2013.01); C23C 14/35 (2013.01); C23C 14/54 (2013.01); H01J 37/3405 (2013.01); H01J 37/3455 (2013.01);
Abstract

Methods of monitoring arcing in a process chamber, processing chambers and monitoring apparatus are described. At least one of the angular or radial position of a magnetron is determined in the chamber relative to a reference location on a surface of the substrate using positional information from one or more motors. An arcing profile is generated comprising a plurality of arcing states measured based at least on the determined angular and/or radial position of the magnetron.


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