Fletcher Jones

Title: The Innovations of Fletcher Jones

Introduction

Fletcher Jones is a notable inventor based in Ossining, NY (US). He holds a total of 5 patents that showcase his contributions to the field of technology and materials science. His work primarily focuses on advancements in magneto-optic storage media and chemical vapor deposition processes.

Latest Patents

Among his latest patents is a dielectric layer for magneto-optic storage media structures. This invention involves a compound glass of SiO, MO, SiO, M,O, or SiO, M,O, with M being selected from elements such as Zr, Ti, Al, Nb, Y, Sn, In, Ta, and Sb. Another significant patent is related to plasma CVD apparatus and processes. This invention outlines methods for producing and utilizing a novel CVD apparatus designed for depositing silicon layers onto suitable substrates. It also includes in-situ etching processes for removing background silicon deposits from the apparatus's interior walls.

Career Highlights

Fletcher Jones has had a distinguished career, working with prominent companies such as IBM and International Business Machines Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Throughout his career, Fletcher has collaborated with notable individuals, including Joseph S. Logan and Kenneth J. Muroski, Jr. These partnerships have contributed to the advancement of his projects and inventions.

Conclusion

Fletcher Jones is a significant figure in the realm of innovation, with a focus on materials science and technology. His patents reflect his dedication to advancing the field and his contributions will continue to influence future developments.