This inventor holds 3 USPTO granted patents and 37 published patent applications. Top assignee: Intel Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations of Feng Zhang in Integrated Circuit Structures
Introduction
Feng Zhang is a prominent inventor based in Hillsboro, OR (US). He is known for his contributions to the field of integrated circuit structures. His innovative work has led to the development of a unique patent that enhances the performance and reliability of electronic devices.
Latest Patents
Feng Zhang holds a patent titled "Fin trim plug structures with metal for imparting channel stress." This patent describes an integrated circuit structure that includes a fin made of silicon. The fin features a top and sidewalls, with the top having a longest dimension along a specific direction. The design incorporates a first isolation structure over one end of the fin and a gate structure that includes a gate electrode positioned over the top and adjacent to the sidewalls. Additionally, a second isolation structure is placed over the opposite end of the fin, ensuring that both isolation structures include a dielectric material surrounding an isolated metal structure. This innovative design aims to improve the performance of integrated circuits.
Career Highlights
Feng Zhang is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing. His work at Intel has significantly contributed to the development of cutting-edge technologies in the electronics industry.
Collaborations
Feng Zhang has collaborated with notable colleagues, including Tao Chu and Minwoo Jang. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Feng Zhang's contributions to integrated circuit structures exemplify the spirit of innovation in the technology sector. His patent on fin trim plug structures demonstrates his commitment to advancing electronic device performance. Through his work at Intel Corporation and collaborations with talented colleagues, Zhang continues to make a significant impact in the field of electronics.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile