Fei Fan Duan

Title: Fei Fan Duan: Innovator in Semiconductor Technology

Introduction

Fei Fan Duan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative semiconductor devices that enhance performance and efficiency.

Latest Patents

Duan's latest patents include a semiconductor device featuring a parallel configuration. This device comprises first and second active regions that extend in parallel within a substrate. It also includes a plurality of conductive patterns that extend across each of the active regions, along with metal lines that overlie and connect these patterns in parallel. Another notable patent is for a filler cell region in a semiconductor device, which includes gate segments aligned with reference lines at the top and bottom boundaries of the region. This design optimizes the layout and functionality of semiconductor devices.

Career Highlights

Fei Fan Duan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor technology, contributing to the development of more efficient and effective devices.

Collaborations

Duan collaborates with esteemed colleagues such as Fong-yuan Chang and Chi-Yu Lu. Their combined expertise fosters innovation and drives progress in semiconductor research and development.

Conclusion

Fei Fan Duan's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the advancement of semiconductor devices, showcasing the importance of innovation in technology.