Company Filing History:
3 out of 497 
2 out of 76 
1 out of 10 
Years Active: 2022-2025
Title: Innovations and Contributions of Inventor Fan Yang
Introduction
Fan Yang is a notable inventor based in Hubei, China. He has made significant contributions to the field of semiconductor technology and wastewater treatment. With a total of 7 patents, his work reflects a commitment to advancing technology and addressing environmental challenges.
Latest Patents
One of Fan Yang's latest patents is a semiconductor device and manufacturing method. This invention involves forming a trench fill structure in a pixel region of a substrate, where a high-k dielectric layer is sandwiched between a side wall of a fill material and the substrate. The method also includes forming a plug structure in a pad region and covering the substrate's surface with a buffer dielectric layer. The process further involves etching the buffer dielectric layer to create openings that expose parts of the substrate and forming a metal grid layer in the pixel region.
Another significant patent is related to a flow electrode capacitive deionization system and a method for recovering phosphorus in phosphogypsum leachate while simultaneously performing brine desalination. This system includes a phosphorus recovery electrodeionization module and a desalination electrodeionization module, interconnected in a circulation. The phosphogypsum leachate enters the phosphorus recovery module, enriching phosphorus into a flow electrode solution, which is then reacted with a ferrous solution to generate vivianite.
Career Highlights
Fan Yang has worked with prestigious institutions such as Huazhong University of Science and Technology and Wuhan Xinxin Semiconductor Manufacturing Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions in semiconductor manufacturing and environmental technology.
Collaborations
Throughout his career, Fan Yang has collaborated with notable colleagues, including Sheng Hu and Xingsheng Wang. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Fan Yang's contributions to technology and environmental solutions through his patents demonstrate his innovative spirit and dedication to improving industry standards. His work continues to influence the fields of semiconductor technology and wastewater treatment.